Paul Francis K’s Post

As far-fetched as this sounds, this startup plans to used a light beam with a wavelength of 0.1nm vs. 13.5nm which is the standard current cutting-edge lithography systems use. A few years out before we see this developed and prototyped but the theoretical gains are significant.

Why use a helium beam instead of an electron beam at the same energy or less?

is proton beam direct write still being considered?

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